专利名称：Photoresist stripping compositions发明人：Irl E. Ward,Francis W. Michelotti申请号：US07/466758申请日：19900118公开号：US04992108A公开日：19910212
摘要：A non-aqueous biodegradable negative photoresist stripping compositionhaving low toxicity and is operable at temperatures at 85° C. or less which comprisesabout 85% by weight of an aromatic hydrocarbon solvent of the formula selected fromthe group consisting of: ##STR1## wherein R.sub.1 and R.sub.2 are the same or differentand each is a member selected from the group consisting of methyl, ethyl n-propyl andisopropyl, and an organic sulfonic acid of the formula:
< P> R.sub.3 --SO.sub.3 H
wherein R.sub.3 is a member selected from the group consisting of phenyl, tolyl,dodecylbenzene and naphthyl, the ratio of the aromatic solvent to organic solvent acidbeing about 60 to 96% by weight to about 4 to 40% by weight.
申请人：WARD; IRL E.,MICHELOTTI; FRANCIS W.
代理人：John Lezdey
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